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Leti @SPIE Advanced Lithography 2018

From 2/25/2018 to 3/1/2018
Convention Center San Jose, California, United States

This year, Leti researchers will present 8 papers, at SPIE Advanced Lithography 2018, the world's premiere lithography event where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Leti also organizes a Workshop named "alternative lithography" in partnership with ARKEMA, EVG and MAPPER. Read more and register 

Don't miss your chance to connect with Leti Lithography experts!

Leti presentations:

  •  "Inorganic guiding template implementation for DSA contact hole shrink process"
Ahmed Gharbi, Florian Delachat, Patricia Pimenta-Barros, Gaëlle Chamiot-Maitral, Maxime Argoud, Celine Lapeyre, Laurent Pain, CEA-LETI (France); Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, Arkema S.A. (France); Raluca Tiron, CEA-LETI (France). [10584-12]
February, 27, 2018 • 2:30 - 2:50 PM


  •  "Measurement of programmed LWR and LER by different metrology techniques", 
Jérôme Reche, CEA-LETI (France) and Univ. Grenoble Alpes (France) and Lab. des Technologies de La Microélectronique (France); Maxime Besacier, Univ. Grenoble Alpes (France) and Lab. des Technologies de La Microélectronique (France); Patrice Gergaud, Yoann Blancquaert, CEA-LETI (France); Guillaume Freychet, Lawrence Berkeley National Lab. (USA); Thibault Labbaye, CEA-LETI (France). . . . . . . . . . . [10585-14]
February, 27, 2018 • 9:00 - 9:20 AM


  •  "Overlay and stitching metrology for massively parallel electron-beam lithography"

Guido Rademaker, Jonathan Pradelles, Stéfan Landis, Stephane Rey, CEA-LETI (France); Anna Golotsvan, KLA-Tencor Corp. (Israel); Tal Itzkovich, KLA-Tencor Israel (Israel); Tetyana Shapoval, Ronny Haupt, KLATencor GmbH (Germany); Erwin Slot, Guido de Boer, Dhara Dave, Marco Wieland, MAPPER Lithography (Netherlands); Laurent Pain, CEA-LETI (France). . . . . . . [10585-29]

February, 27, 2018 • 4:40 - 5:00 PM


  • « Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications"

Patricia Pimenta-Barros, Guillaume Claveau, Maxime Argoud, Zdenek Chalupa, Nacima Allouti, Corinne Comboroure, Gaëlle Chamiot-Maitral, CEA-LETI (France); Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, Arkema S.A. (France); Laurent Pain, Raluca Tiron, CEA-LETI (France). . . [10584-11]

February, 27, 2018 • 2:10 - 2:30 PM | Part of SPIE Advanced Lithography


  • "Pillars fabrication by DSA lithography: material and process options"
Ahmed Gharbi, Patricia Pimenta-Barros, Olivia Saouaf, Laurent Pain, CEA-LETI (France); Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, Arkema S.A. (France); Michele Perego, Istituto per la Microelettronica e Microsistemi (Italy); Steven Gottlieb, Instituto de Microelectrónica de Barcelona (Spain); Esteve Amat, Ctr. Nacional de Microelectrónica (Spain); Marta Fernández-Regúlez, Instituto de Microelectrónica de Barcelona (Spain); Francesc Pérez-Murano, Ctr. Nacional de Microelectrónica (Spain); Raluca Tiron, CEA-LETI (France). . . [10586-25]

February, 28, 2018 • 9:40 - 10:00 AM


  •  "Advanced rules-based corrections strategies and their application for master manufacturing and replication on the 200mm wafer scale SmartNIL process"
Hubert Teyssedre, Jacky Chartoire, Patrick Quemere, Maryline Cordeau, Loïc Perraud, Stéfan Landis, Jérôme Hazart, Laurent Pain, CEA Grenoble (France). . [10588-6]

February, 28, 2018 • 11:30 - 11:50 AM


  •  "Evaluation of anti-sticking layers performances for 200mm wafer scale smart NILTM process through surface and defectivity characterizations"
Florian Delachat, CEA-LETI (France) and Pleiades Technologies (France); Jean-Côme Phillipe, Vincent Larrey, Frank Fournel, Sandra Bos, Stefan Landis, Hubert Teyssèdre, CEA-LETI (France); Jonas Khan, EV Group (Austria); Laurent Pain, CEA-LETI (France); Markus Wimplinger, EV Group (Austria); Xavier Chevalier, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Arkema S.A. (France). . [10586-41]

March, 1st, 2018 • 9:20 - 9:40 AM


  • "Process development for the maskless N40 via layer for security application"
Isabelle Servin, Patricia Pimenta-Barros, Allan Germain, Arthur Bernadac, Jonathan Pradelles, Yoann Blancquaert, Philippe Essomba, Stéfan Landis, CEA-LETI (France); Gerard F. ten Berge, Marco Wieland, MAPPER Lithography (Netherlands). . . . . [10584-36]
1 March 2018 • 11:10 - 11:30 AM | Part of SPIE Advanced Lithography

Practical information

​Convention Center San Jose, Californie, Etat-Unis 

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