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“On the same mask, with this design kit, we are able to have photonic circuits performing various functions, according to the area of expertise of the different contributors,” said Andre Myko, responsible of MPW runs at Leti. “Fabless companies and academics therefore can realize substantial cost savings by ‘sharing’ production costs on multi-project wafer runs.”
“Leti’s process design kit available for Synopsys’ PhoeniX OptoDesigner is a licensed plug-in library of solutions that support multi-project wafers and custom runs provided by Leti,” said Niek Nijenhuis, global business development manager of Synopsys’ PhoeniX OptoDesigner products. “In addition to the photonic elements from the standard OptoDesigner library, Leti’s PDK contains technology-specific information like mask layer names, design rules, validated building blocks, die sizes and GDS file settings.” Leti’s silicon photonics platform is also fully compatible with STMicroelectronics’ platform in Crolles, which enables fabless customers to take their new circuits to high-volume production.
CEA is a French government-funded technological research organisation in four main areas: low-carbon energies, defense and security, information technologies and health technologies. A prominent player in the European Research Area, it is involved in setting up collaborative projects with many partners around the world.