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 Webinar: Discover an innovative compositional depth profiling technique

The 4/4/2017
Webinar Europe: 9am/4pm (London); USA: 11AM EST,  8AM PST; CHINA: 4pm (Beijing)

Join us for a live webinar on Discover an innovative compositional depth profiling technique.

Event Overview:
Plasma Profiling TOFMS (PP-TOFMS) is a novel technique for material characterization that provides ultra-fast and direct elemental composition as a function of depth. We will show you through numerous examples the potential of PP-TOFMS for the development of your thin films and devices, from growth to processing.

Key Learning Objectives:
  • Become familiar with the essential characteristics of this technique (speed, sensitivity, resolution)
  • Learn how PP-TOFMS will be complementary to your current chemical profiling techniques (XPS, SIMS, SEM-EDX, RBS)
  • Demonstrate how useful PP-TOFMS can be as a quick, close-loop process tool

Who Should Attend?
  • Academic material research scientists and R&D engineers working in semiconductors, microelectronics, photonics, photovoltaics
  • Metrology managers and engineers, surface scientists, XPS, SIMS, AES users 

  • Agnès Tempez, PhD
Product Manager, HORIBA Scientific

  • Yann Mazel
Metrology Engineer, Leti

  • Emmanuel Nolot, PhD
Metrology Leader, Leti

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